EUV exposure device for resist analysis EUVES-7000
EQ-10 equipped with EUV light source, extreme ultraviolet light compatible analysis exposure device.
The EUV exposure device EUVES-7000 for resist analysis is equipped with the EQ-10 EUV light source manufactured by Energetiq Technology in the United States, enabling open-frame exposure compatible with extreme ultraviolet light at a wavelength of 13.5 nm.
- Company：リソテックジャパン
- Price：Other
